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General Abbreviations
ОглавлениеThe “[]” contains units for parameter or molar concentration.
| A | absorptance |
| A BET | powder specific surface area [m2/g], determined by the same calculation model applied to experimental gas adsorption data |
| AR | anti-reflective |
| ArS | sintering under 1 atm. of argon |
| AS | sintering under 1 atm. of air |
| a-SiO2 (or other | amorphous silica |
| chemical compound) | |
| Vol%, atm.% or mol % | volume, atomic or molar percentage |
| wt.% | weight percentage |
| B | magnetic induction (or magnetic flux density) [T (=104 G (the gauss (G) is used in (cgs system)))] |
| BD | bulk density (g/cm3 or % of TD) |
| BD f | fired state density |
| BD g | green-body density |
| BET | Brunauer–Emmett–Teller |
| c | cubic lattice |
| CAD | computer-assisted design |
| CAM | computer-assisted machining |
| CCT | correlated color temperature |
| CF | crystal field |
| CFT | crystal field theory (used for electronic spectra interpretation) |
| CIE | commission int. de l`èclairage |
| CRI | color rendition index |
| CVD | chemical vapor deposition |
| CW | continuous wave laser |
| D 0 | ionic diffusion coefficient at standard temperature [cm2 or m2/s] |
| D 50 | median particles size in a distribution |
| D BET | equivalent particle diameter [nm] as calculated by BET method |
| DTA | derivatographic thermal analysis |
| E | Young modulus [GPa] |
| EDS (EDX) | energy dispersive X-ray spectroscopy (for elemental chemical analysis) |
| EFG | edge defined film fed growth (technique for crystals growth) |
| EMPA | electron microscope probe elemental analysis |
| EMR | electromagnetic radiation |
| EO | electro-optic |
| EPR | electron paramagnetic resonance |
| ESR | electron spin resonance |
| FEA | finite element analysis |
| FIR | far infrared subdomain (15–1000 μm) |
| FOG (or FOX) | fluoro-oxide glass |
| GB | grain boundaries |
| GS | grain size |
| GSM | maximal GS |
| GSm | minimal GS |
| H | magnetic field strength [A/m; Oe (in cgs system)] |
| h | Planck's constant |
| HAADF | high angle annular dark field imaging |
| HIP | hot isostatic pressing |
| HK | hardness measured with the Knoop indenter |
| HP | hot pressing |
| HR-SEM | high resolution SEM |
| HR-TEM | high resolution TEM |
| HV | hardness measured with the Vickers indenter |
| IR | infrared domain of the spectrum |
| k or kB | Boltzmann's constant |
| k | wave vector (magnitude is the wave number) |
| K Ic | [MPa m0.5] |
| LCD | liquid crystal display |
| LED | light-emitting diode |
| LF | ligand field |
| LFT | crystal field theory improved by consideration of covalency |
| m | monoclinic |
| M b | grain-boundaries migration rate in pore-free matrix |
| MIR | middle domain of IR (2.5–15 μm) |
| MW | microwaves (EMR of wavelength 1 mm to ∼3 dm) |
| N C | critical coordination number, in particles, of pores |
| NIR | near infrared subdomain of the IR (0.75–2.5 μm) |
| NUV | near ultraviolet subdomain (300–380 nm) |
| OLED | organic light emitting diode |
| op | open porosity (%) |
| OPA | optical parameter amplifier |
| OPA–CPA | amplifier based on chirped pulse amplification |
| PCA | polycrystalline (ceramic) alumina |
| PECS | pulsed electric current sintering (alternative to SPS) |
| PL | photo luminescence |
| PLE | photo luminescent emission |
| PLED | power LED |
| PLZT | La containing PZT |
| PMN | plumb magnesium niobate |
| Po | porosity [vol%] |
| PoSD | pore size distribution |
| PS | pressureless (viz., at around 1 atm. of gas pressure) sintering |
| PSD | particle size distribution |
| PT | ceramic with composition located in the PbO–TiO2 system |
| PVDF | polyvinylidene fluoride |
| PW | power [W] |
| PZT | ceramic with composition located in the PbO–ZrO2–TiO2 system; main source of piezoceramics |
| R | gas constant |
| R | reflectance |
| RE + | rare-Earth cation |
| RIT | real in-line transmission |
| RT | room temperature |
| RTP | ready-to-press powder |
| S | scattered fraction of incident EMR beam intensity |
| SEM | scanning electron microscope |
| SIMS | secondary ions mass spectroscopy |
| SOX | solid oxides |
| SPS | spark-plasma sintering |
| STEM | scanning TEM |
| t | tetragonal |
| t a 0 | post-sintering annealing (mostly in air) temperature |
| t f | melting (fusion) temperature |
| t g | glass transition temperature |
| t l | liquidus temperature (phase diagrams) |
| t s 0 | sintering temperature |
| T | transmittance (T% transmission percentage) |
| T% | transmission (in %) as a function of wavelength |
| TC | transparent ceramic |
| TD or ρ | theoretical density [g/cm3] |
| TEM | transmission mode electron microscope |
| TEOS | tetra-ethyl-ortho-silicate |
| TFT | total forward transmission |
| TGC | transparent glass-ceramic |
| TGG | Terbium, Gadolinium garnet |
| TM+ | transition element cation |
| TRS | transversal rupture strength |
| T-YAG (or other | transparent YAG |
| transparent ceramic | |
| compound) | |
| TZP | tetragonal zirconia polycrystals |
| UV | ultraviolet domain of the spectrum (10 to ∼380 nm) |
| VIS | segment of the electromagnetic radiation spectrum to which the human eye is sensitive (∼0.38 to ∼0.75 μm) |
| VS | sintering under vacuum |
| WLED | white light emitting LED |
| X | powder particle size |
| XRD | X-ray diffraction |
| YAG | Yttrium, Aluminum garnet |
| YSAG | scandium containing |
| [K−1] | thermal expansion coefficient [°C/K] |
| γ | surface tension [N/m] |
| Δ | small variation |
| ε | extinction coeff. [l/(mol cm)] |
| λ | wavelength [nm, μm] |
| λ th | thermal conductivity [W/Km] |
| ν | frequency [Hz] |
| ν - | wave number [cm−1] |
| τ | time |
| φ | phase of wave |
