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DIAMOND‐LIKE CARBON FILMS without hydrogen can be prepared by carbon ion beam deposition, by ion‐assisted sputtering from GRAPHITE, or by laser ablation of GRAPHITE. DIAMOND‐LIKE CARBON FILMS containing significant contents of hydrogen are prepared by chemical vapor deposition. The hydrogen content is usually over 25 atomic %. The deposition parameters are (low) total pressure, hydrogen partial pressure, precursor molecules, and plasma ionization. The plasma activation can be radio frequency, microwave, or Ar⁺ ions. High ionization favors amorphous films, while high atomic hydrogen contents favor DIAMOND crystallite formation. Because of the confusion about structure engendered by the term DIAMOND‐LIKE CARBON FILMS, the term HARD AMORPHOUS CARBON has been suggested as a synonym.

See: DIAMOND, GRAPHITE, HARD AMORPHOUS CARBON.