Читать книгу The ESD Control Program Handbook - Jeremy M. Smallwood - Страница 74

2.8.1 ESA and Particle Contamination

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These effects can be important where cleanliness of the product is essential. In a clean room for wafer fabrication, an electrostatic field can cause charged dust particles that are present to be transported to a wafer within the field. Particle contamination can then cause loss of product yield (Welker et al. 2006).

Other processes in which product cleanliness is important can include

 Manufacture of flat‐screen displays. Loss of even a small number of pixels due to contamination can result in rejection of the product.

 Packing of consumer products where dust or particle contamination can mar the appearance of the product before purchase.

 Assembly of optical systems where performance can be reduced by contamination.

 Assembly of medical systems where infection of the user may be a risk.

The ESD Control Program Handbook

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