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3.1. Point defects in monolayer MoS2
ОглавлениеTwo-dimensional layered MoS2 is a typical semiconductor with a well-known cross-over from indirect to direct bandgap when the thickness decreases from bulk to monolayer, as a result of quantum confinement effect. Semiconducting MoS2 (E.g., 1.3–1.8 eV) can be promising building blocks of photodetectors, gas sensors, and opto/electronic devices. To synthesize MoS2 atomic layers in large scale, chemical vapor deposition (CVD) [16, 17] has been demonstrated as a feasible route to realize the scalable nanoelectronic applications based on large-size high-quality thin films. However, plenty of point defects and grain boundaries are still inevitably present in the atomic thin layers after the CVD growth.